Designed for low cost, convenience and low footprint. Capable of high end thermal ALD coating.
Powder chamber
250mL Transparent
High-Speed Manifold
Inclinded Rotating
Transparent bottle with easy switching and cleaning, plus optional valves to isolate external gases. Internal lighting lets you observe powder status in situ.
Fast-actuating pneumatic ALD valves with multi-zone heating eliminate cold spots and ensure repeatable millisecond precursor dosing cycles. Compatible with low-evaporation precursor processes
Disperse powder samples while minimizing plugging.
Uniqueness:
Low cost, affordable; reliable; user friendly.
Fast loading transparent standard powder chamber（bottle）.
Special designed vale to avoid O2 and H2O for sensitive powder sample tranferring from/to glovebox.
UV activation in powder system.
Isolation Valve
Specification table
350 °C
maximum powder chamber heating
250mL
Transparent/ easy switching/ optional valves for isolation
4~8 lines
precursor delivery channels
Configure Your ALD System
Consult directly with thinfilm process specialists to review custom chamber volumes, gas delivery configurations, and specific precursor chemistries.
Angstrom Thinfilm Technologies
2825 Broadbent Business Park, Unit AAlbuquerque, NM 87107, USA
Headquarter
1120 Nimitz Ln, Foster City, CA 94404, USA